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| SDI ID | Manufacturer | Model | Description | Version | Vintage | Q. ty | Sales Conditions | Lead Time |
|---|---|---|---|---|---|---|---|---|
| 111413 | AMAT | Centura RTP Vantage | 300mm | 1 | as is where is | immediately | ||
| 108557 | Applied Materials | Centura EPI | Epitaxial Deposition, reduced pressure, 2 chamber | 300 mm | 01.05.2002 | 1 | as is where is | immediately |
| 91158 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | |
| 91159 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2001 | 1 | inquire | |
| 91160 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 91162 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 1 | as is where is | ||
| 108059 | Applied Materials | CENTURA 2 DPS | Deep Trench Etcher, 2 chambers | 150 mm | 1 | as is where is | ||
| 108060 | Applied Materials | Centura 5300 HDP Omega | Dry etch cluster tool with 2 Chambers SIO2 etch | 200 mm | 1 | as is where is | ||
| 110620 | Applied Materials | Centura Enabler | Dry etcher | 300 mm | 1 | as is where is | ||
| 91168 | Applied Materials | Centura WCVD | WSIX(OPTIMA) | 200 mm | 31.05.2000 | 1 | inquire | |
| 100909 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 31.05.2015 | 1 | as is where is | |
| 100910 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 31.05.2015 | 1 | as is where is | |
| 100911 | Applied Materials | CENTURA DPS ll MESA T2 | Poly Etcher | 300 mm | 31.05.2016 | 1 | as is where is | |
| 103473 | Applied Materials | CENTURA DPS G3 | Poly 1ch / Mesa 1ch | 300 mm | 31.05.2007 | 1 | as is where is | |
| 103474 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2003 | 1 | as is where is | |
| 103475 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2005 | 1 | as is where is | |
| 103476 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 31.05.2010 | 1 | as is where is | |
| 103477 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 103478 | Applied Materials | CENTURA DPS G5 MESA | MESA 3ch / Axiom 1ch | 300 mm | 1 | as is where is | ||
| 108345 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300 mm | 7 | as is where is | ||
| 108347 | Applied Materials | Centura AP AdvantEdge G5 Poly | Polysilicon Etch | 300 mm | 2 | as is where is | ||
| 108348 | Applied Materials | Centura AP ASP II - Chamber Only | Metal Etch | 300 mm | 1 | as is where is | ||
| 108349 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300 mm | 3 | as is where is | ||
| 109134 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | ||
| 106575 | Applied Materials | Centura AP Ultima Chamber | HDPCVD Chamber only | 300 mm | 1 | as is where is | ||
| 109135 | Applied Materials | Centura 5200 Ti/TiN MCVD | Metal CVD (Chemical Vapor Deposition) | 200mm | 1 | as is where is | ||
| 106576 | Applied Materials | CENTURA DPS G3 | Poly 2ch / Mesa 1ch | 300 mm | 01.06.2001 | 1 | as is where is | |
| 109136 | Applied Materials | Centura AP AdvantEdge G5 Mesa Poly | Polysilicon Etch | 300mm | 1 | as is where is | ||
| 106577 | Applied Materials | CENTURA DPS G3 | Poly 3ch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 109137 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300mm | 1 | as is where is | ||
| 106578 | Applied Materials | CENTURA DPS G3 | Poly 3ch | 300 mm | 01.06.2006 | 1 | as is where is | |
| 109138 | Applied Materials | Centura AP AdvantEdge G5 Mesa T2 Poly | Polysilicon Etch | 300mm | 1 | as is where is | ||
| 106579 | Applied Materials | CENTURA DPS G3 | Poly 3ch / Axiom 1ch | 300 mm | 01.06.2013 | 1 | as is where is | |
| 109139 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | ||
| 106580 | Applied Materials | CENTURA DPS G3 | Poly 3ch / Axiom 1ch | 300 mm | 01.06.2010 | 1 | as is where is | |
| 109140 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | ||
| 106581 | Applied Materials | CENTURA DPS G5 MESA | Poly 3ch / AXIOM 1ch / Server OS Type | 300 mm | 01.06.2011 | 1 | as is where is | |
| 109141 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | ||
| 106582 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2001 | 1 | as is where is | |
| 109142 | Applied Materials | Centura AP AdvantEdge G5 Metal | Metal Etch | 300mm | 1 | as is where is | ||
| 106583 | Applied Materials | CENTURA 5200 DPS | Poly Etcher | 200 mm | 01.06.1999 | 1 | as is where is | |
| 109143 | Applied Materials | Centura AP AdvantEdge G5 Poly | Polysilicon Etch | 300mm | 1 | as is where is | ||
| 109144 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300mm | 1 | as is where is | ||
| 109145 | Applied Materials | Centura AP DPS AdvantEdge G2 Metal | Metal Etch | 300mm | 1 | as is where is | ||
| 109146 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300mm | 1 | as is where is | ||
| 109147 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300mm | 1 | as is where is | ||
| 109148 | Applied Materials | Centura AP DPS AdvantEdge G2 Poly | Polysilicon Etch | 300mm | 1 | as is where is | ||
| 108133 | Applied Materials | CENTURA MCVD | WxZ Optima | 200 mm | 01.06.2000 | 1 | as is where is | |
| 93034 | Applied Materials | CENTURA ENABLER E2 | Oxide Etcher /server OS PC | 300 MM | 31.05.2007 | 1 | as is where is | |
| 93035 | Applied Materials | CENTURA ENABLER E5 | Oxide Etcher /server OS PC | 300 MM | 31.05.2010 | 1 | as is where is | |
| 110712 | Applied Materials | Centura 5200 HTF Epitaxial | 3 Chamber Atmospheric Epitaxial Deposition system | 200 MM | 01.06.1996 | 1 | as is where is | immediately |
| 110713 | Applied Materials | Centura 5200 HTF Epitaxial | 3 Chamber Atmospheric Epitaxial Deposition system | 200 MM | 01.06.1999 | 1 | as is where is | immediately |
| 91269 | Applied Materials | CENTURA 5200 | MxP Poly | 200 mm | 1 | as is where is | ||
| 91277 | Applied Materials | Centura DPS II CHAMBER | Chamber only | 300 mm | 1 | as is where is | ||
| 91279 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91280 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91281 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91282 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 91283 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 31.05.2008 | 1 | as is where is | |
| 108701 | Applied Materials | Centura 5200 High K CVD Process Chamber | CVD Process Chamber | 200 mm | 1 | as is where is | immediately | |
| 108705 | Applied Materials | Centura 5200 MxP Chamber | MxP Etching Chamber | 200 mm | 1 | inquire | immediately | |
| 91316 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
| 91317 | Applied Materials | CENTURA ENABLER | Oxide Etcher /server OS PC | 300 mm | 1 | as is where is | ||
| 109541 | Applied Materials | Centura AP DPS 2 G5 | Polysilicon etcher, 3 chamber | 300 mm | 01.08.2008 | 1 | as is where is | immediately |
| 109542 | Applied Materials | Centura DPS II Advantedge POLY | POLY ETCHER, 4 CHAMBER | 300 mm | 01.06.2010 | 1 | as is where is | immediately |
| 94439 | Applied Materials | Centura WCVD | WxZ Optima | 200 mm | 1 | as is where is | ||
| 109543 | Applied Materials | Centura AP DPS 2 Advantedge Mesa | Polysilicon Etcher with 4 chambers | 300 mm | 01.08.2006 | 1 | as is where is | immediately |
| 109544 | Applied Materials | Centura 5200 AP DPS2 Advantedge Carina Mesa | Dry Etch Cluster Tool - 2 CHAMBER - METAL ETCH PROCESS | 300 mm | 01.05.2013 | 1 | as is where is | immediately |
| 109545 | Applied Materials | Centura AP DPS II Advantedge | Polysilicon Etcher with 4 chambers | 300 mm | 01.06.2006 | 1 | as is where is | immediately |
| 109549 | Applied Materials | Centura DPS2 AE Minos Poly | Dry Etch with 2CH DPS2 and 2 CH Axiom | 300 mm | 01.06.2006 | 1 | as is where is | immediately |
| 111354 | Applied Materials | Centura 5200 XE+ | RTP system with TPCC | 200 mm | 1 | as is where is | immediately | |
| 111355 | Applied Materials | Centura 5200 XE+ | RTP system with TPCC | 200 mm | 01.06.2003 | 1 | as is where is | immediately |
| 108162 | HYPERFLOW | CENTURA WET | Wafer Carrier Boat Wash System | 150 mm | 1 | as is where is |